Apr 7, 2020   3:22 p.m. Zoltán
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Ing. arch. Ing. Ľubomír Vančo, PhD.
Identification number: 29125
University e-mail: lubomir.vanco [at] stuba.sk
 
Výskumný pracovník s VŠ vzdelaním - STU Centre for Nanodiagnostics (UVP OUP REK)

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The following list contains all information available to the publication.

CHAUHAN, P. -- HASENÖHRL, S. -- DOBROČKA, E. -- CHAUVAT, M. -- MINJ, A. -- GUCMANN, F. -- VANČO, Ľ. -- KOVÁČ, J. -- KRET, S. -- RUTERANA, P. -- KUBALL, M. -- ŠIFFALOVIČ, P. -- KUZMÍK, J. Evidence of relationship between strain and In-incorporation: Growth of N-polar In-rich InAlN buffer layer by OMCVD. Journal of Applied Physics, p. 5304.

Original name: Evidence of relationship between strain and In-incorporation: Growth of N-polar In-rich InAlN buffer layer by OMCVD
Name in Slovak:
Written by (author): Prerna Chauhan (5%)
Stanislav Hasenöhrl (10%)
doc. RNDr. Edmund Dobročka, CSc. (10%)
Marie-Pierre Chauvat (5%)
A. Minj (5%)
Ing. Filip Gucmann, PhD. (10%)
Ing. arch. Ing. Ľubomír Vančo, PhD. (10%)
doc. Ing. Jaroslav Kováč, PhD. (15%)
S. Kret (5%)
Pierre Ruterana (5%)
Martin Kuball (5%)
Peter Šiffalovič (10%)
Ján Kuzmík (10%)
Department: STU Centre for Nanodiagnostics
Institute of Electronics and Phototonics
Kind of publication: articles in magazines
Periodical: Journal of Applied Physics
Volume no. (year):
Starting page: 5304
Up to page: 5304
Number of pages: 1
Original language: English
Publication category: ADC Vedecké práce v zahraničných karentovaných časopisoch
Scientific field:
Year of submission: 2019
Year of transmission: 2019
 
Entry made by: doc. RNDr. Edmund Dobročka, CSc.
Last change: 11/09/2019 22:21 (Data import from library)


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Journal of Applied Physics. 2019.

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Year of publication: 2019
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Year of submission: 2019
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Last change: 01/25/2020 22:21 (Data import from library)