Investigation of the next generation implantation and deposition processes to obtain atomic clean surfaces for increased adhesion and the preparation of hard TiAlN coatings with reduced internal stress.Supervisor: Ing. Marcel Meško, Ph.D.
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|Project description:||The aim of this project is preparation of the gradient nanocomposite TiAlN coatings by next generation of implantation a deposition process (PIII&D) based on high power impulse magnetron sputtering (HiPIMS). In the proposed project, we focus mainly on the preparation of atomically clean surfaces by means of plasma etching with metal ions to increase adhesion and reduce tension in the coating by ion implantation. Pre-treatment of metal surface prior to coating process using plasma cleaning in electrolyte to increase the adhesion of the coating-substrate system will be investigated as well. After optimization of the cleaning process parameters, the impact of morphology, microstructure and chemical composition of treated surfaces on the adhesion of TiAlN coatings will be examined.|
|Kind of project:||VEGA ()|
|Department:||Advanced Technologies Research Institute (MTF)|
|Project start date :||01. 01. 2020|
|Project close date:||31. 12. 2022|
|Number of workers in the project:||10|
|Number of official workers in the project:||0|